Plating Voids - Part iiPart 3 in the series "Trouble in your tank?" by Michael Carano |
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IntroductionIn the last article, we began our exploration of PTH voids. In this insertion, we will discuss many of the other causes of PTH voids.Pre-electroless causes of voidsIt is often said by seasoned engineers that there are so many process steps and variables that will have an influence on the success or failure of getting a continuous void free copper deposit in the hole. One of the obvious causes of voids or at least poor copper coverage is the result of poor drilling. Figure 1 below shows voids on the glass bundle fibers. A closer look as this section will show a very poorly drilled hole wall, with glass bundles protruding from the resin. Figure 1:![]() Glass fiber bundles are torn out exposing a deep gouge in the resin. Astonishingly, many feel the plating process should always compensate for such a travesty. A surface such as the one shown here makes it very difficult to catalyze with the palladium-based activator from the electroless copper process. One should immediately investigate the drilling operation, looking at the following:
![]() The desmear operation is another potential cause of PTH voids. The most effective desmear process available today is based on alkaline permanganate. As a matter of fact, the permanganate system is considered an industry standard. The use of alkaline permanganate for multiplayer pwb's has had a dramatic effect on copper coverage and adhesion in the plated through hole. However, this process, if not controlled, can be a major cause of voids. First, the process consists of three main chemical process steps:
For example, the effective alkaline permanganate process not only removes drill smear, but will micro-roughen the resin as shown in figure 3. This texturing is often referred to as the honeycombed appearance. This is desirable for two reasons:
Regardless, if the texturing is inadequate, the possibility of voids exists. Then main reason is that the lack of texturing will reduce catalyst adsorption, leading to voids. Electroless copper processes require an adequate amount of catalyst on the hole wall in order to promote the electroless copper deposition. Key questions to ask in the brainstorming session:
If solvent compatibility and degree of penetration is sufficient, then consider utilizing a higher concentration of permanganate. Sodium permanganate will allow for more actual permanganate in solution over the corresponding potassium salt. And finallyReview the neutralizer and glass-etch. A Major cause of voiding is due to manganate residues remaining on the hole wall resin and glass. One should frequently renew this solution to insure fresh working chemistry. Also, check the acid concentration. Lower concentration reduces the effectiveness of the neutralization.Often, in order to reduce process steps, fabricators will combine the neutralizer and glass etch in the same process tank. (This writer prefers separate steps as the process is more effective). As the glass etch weakens due to continued use, the ability of the glass etch to roughen the glass fibers (referred to as " frosting") is reduced. This in turn reduces the ability of the catalyst to adhere to glass. When this happens, voids are the result. |
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